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Opening the shelf…
Book dossier
by Annie Baudrant
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Dopants and defects in semiconductors
Matthew D. McCluskey
Impurities in Semiconductors
Victor I. Fistul
Doping in Conjugated Polymers
Pradip Kar
Semiconducting polymers
Georges Hadziioannou
Rapid Thermal Processing
Richard B. Fair
Ion Implantation
Heiner Ryssel
Liquid-phase oxidation of unsaturated compounds
V. L. Rubaĭlo
Ion implantation technology-92
International Conference on Ion Implantation Technology (9th 1992 Gainesville, Fla.)
Materials modification and growth using Ion beams
Alice E. White